For twenty years, CVD Equipment Corporation has been providing custom research and production Chemical Vapor Deposition systems to many of the large semiconductor manufacturers and research laboratories. We can fabricate from your drawings or use our in-house engineering to bring your ideas to fruition. Our innovative solutions to your needs comes from years of experience, while our extensive Computer Aided Design (CAD) systems library helps minimize basic design engineering by drawing on concepts previously used. Our CAD systems allow you to visualize your system prior to fabrication.

Our expertise in controlling gas flow, pressure or vacuum levels and temperature can help solve your problems. System designs allow for process heating via resistance, induction or infra-red and operational pressures from Ultra High Vacuum to 50 Atmospheres. In addition, we have our own quartzware fabrication facility to quickly manufacture process chambers, gas injectors, wafer boats and other work fixtures.

For process control, our standard Microprocessor Control System is extremely versatile and provides for real-time control in either an automatic or manual control mode. The Pentium based microprocessor control system generates the rampable, programmable temperature, pressure and gas flow profiles. It also sequences valves, movements, vacuum pumps and continuously monitors and displays on a real-time basis all temperatures, pressures, gas flows, valve status, safeties, etc. The system data logs process parameters and allows for hard copy printout or exporting of data to a spreadsheet. Our "User Friendly" software allows recipes to be written and executed with simple commands for even the most intricate layers.

　

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